|Name||Ms. Olivia Hawkins|
|Organization or Institution||University of Florida|
Photochemical Reactions of Ruthenium Precursors for Photo-Assisted Chemical Vapor Deposition
Olivia M. Hawkins1, Christopher R. Brewer1, Bryan Salazar2, Amy V. Walker2 and Lisa McElwee-White1
1- Department of Chemistry, University of Florida, Gainesville, Florida 32611, USA
Chemical vapor deposition (CVD) has attracted interest as a potential method for the metallization of organic thin films. However, thermal CVD processes often require elevated temperatures that are incompatible with organic substrates. Photochemical techniques provide an alternative method of initiating precursor decomposition without thermally damaging the substrate. Accessible Ru precursors, including (η3-allyl)Ru(CO)3X and CpRu(CO)2X (X=Cl, Br, I), have been utilized in depositing Ru on functionalized self-assembled monolayers via photochemical CVD, providing a model for deposition of metal on thermally-sensitive substrates. Identification of the primary photoprocess and determination of the quantum yields for disappearance of starting material and product formation will be discussed in the context of precursor design for photochemical deposition.